Product Details
Upper and lower cover inner ring design effectively reduces wafer lateral movement while ensuring that it does not press to wafer edges.
Lock catch secure system and inner side impact resistant space design provide effective protection during wafer transportation .
It can effectively reduce the overall weight while optimizing the product design.
The design conforms to the automatic interface of process equipment.
Wafer Size |
Material |
Surface Resistance |
Internal Diameter |
Internal height |
6″
(150mm) |
Antistatic PP |
10E4Ω-10E11Ω
|
151mm |
44mm |
8″
(200mm) |
Antistatic PP |
10E4Ω-10E11Ω |
201mm |
44mm |
12″
(300mm) |
Antistatic PP |
10E4Ω-10E11Ω |
301mm |
71mm |